Adorned in full body gear to rid of all falling particles like a surgeon ready to perform a complex procedure. The week spent in clean room was worth the hassle. i am now an expert in operating the Nordiko 2000 Physical Vapour Deposition machine. this ex-industry machine can be used to deposit thin layers of materials onto substrate placed above the target chamber where target materials are turned into plasma by application of RF power on a high vacuum chamber.
Dealing with laser devices of 1mm length and try to coat their facet which are about 350 micron wide is not trivial matter. I am hoping to perfect the technique in the coming weeks.
I have mapped the deposition area using 6 inch silicon wafer. Using Ellipsometer i measured the wafer after an hour of exposure and the rate of deposition is 3.3 nanometer per minute. This information is crucial for better results in future operations.
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